Silicon Carbide Sputtering Target,CAS : 409-21-2

E FORU specializes in producing high purity   Silicon Carbide Sputtering Target CAS #: 409-21-2  with the smallest possible average grain sizes,Purities may include 99%, 99.9%, 99.99%, 99.999% and 99.9999%, which are sometimes referred to as 2N, 3N, 4N, 5N and 6N. 99.99995% (6N5), and in some cases up to 99.99999% (7N) and 99.999999% (8N),Our standard powder particle sizes average in the range of - 325 mesh, - 200 mesh,- 100 mesh, 10-50 microns and submicron ( 144 micron). We can also provide  in the nanoscale range.Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. Nanoparticles also produce very high surface areas.Production of metallic carbide materials including boron carbide, cobalt carbide, chromium carbide, hafnium carbide, molybdenum carbide, niobium carbide, tantalum carbide, titanium carbide, vanadium carbide, zirconium carbide, and numerous others.Like diamond, a pure carbon compound, carbide compounds tend to be extremely hard, refractory and resistant to wear, corrosion and heat, making them excellent candidates for coatings for drills and other tools. They often have other valuable properties in combination with toughness, such as electrical conductivity, low thermal expansion and abrasiveness.Quality inspection department staff which uses atomic spectroscopy, x-ray diffraction analysis, scanning electron microscopy, glow discharge mass spectroscopy (GDMS), and BET surface area analysis, among other technologies, to ensure that the elemental composition and structural properties of each product rigorously adhere to our standards.